8TH ANNUAL WORKSHOP ON SECONDARY ION MASS SPECTROMETRY
The meeting was held at the Split Rock Resort and Conference Center,
Lake Harmony, PA, May 7-10, 1995
May 8, 1995 SIMS WORKSHOP
8:30 AM - 5:30 PM TUTORIAL PRESENTATIONS
8:30-8:45 Opening Remarks/Welcome
8:45-9:30 The Relationship of SIMS to Billiards, Barbara J. Garrison, Department
of Chemistry, Penn State University
9:30-10:15 A Brief Review of the Mechanisms for Secondary Atomic Ion Emission-
Ming L. Yu, IBM , Yorktown Heights, NY 10:15-10:45 Break
10:45 -11:30 SIMS: Life, The Universe and Everything or How Secondary Ion
Mass Spectrometry Can be Applied to a Wide Variety of Semiconductor Materials
Problems", Charles W. Magee, Evans East, Plainsboro, New Jersey,
11:30 -12:15 How Quantitative is Dynamic SIMS Analysis of Semiconductors?
Dave Simons, NIST
12:15 - 1:15 PM LUNCH
1:15 -2:00 Isotopic Ratio Measurements by SIMS, Larry Nittler, Department
of Physics, Washington University, St. Louis, MO
2:00 -2:45 SIMS Imaging of Ionic and Molecular Transport at Subcellular
Resolution, Subhash Chandra, Department of Chemistry, Cornell University
2:45 -3:15 Break
3:15 - 4:00 High Resolution Ion Microscopy, Jon Orloff, Department of Electrical
Engineering, University of Maryland
4:00 -4:45 Analyzing the Kitchen Sink: A Review of Current Application Areas
for TOF-SIMS and the Technology That Makes it Possible, Fraser Reich, PHI
Evans
4:45- 5:30 Semiconductor Characterization Using Focused Ion Beams, Fred
Stevie, AT&T
6:30-7:30 PM POSTER PRESENTATIONS/Happy Hour
The Depth Measurement of Craters Produced by Secondary Ion Mass Spectrometry-Results
of a Stylus Profilometry Round-robin Study, Dave Simons, NIST
Detection of Sputtered Neutrals by Ultra-High Intensity Post Ionization,
Michael L. Wise, AT&T Bell Labs, Murray Hill
Reaction Studies of Polycyclic Organic Matter on Silica Gel and Coal Flyash
by TOF-SIMS, G.S. Strossman, Charles Evans and Associates
Kinetic Energy and Angular Distributions of Sputtered Molecules, Reema Chatterje,
Department of Chemistry, Pennsylvania State University
Laser Ionization Studies of Sputtered Neutral Organic Molecules, Donald
Riederer, Department of Chemistry, Pennsylvania State University
Angular Distribution of Ions from GaAs{100} c( 4x4) Reconstruction and GaA{100}/Al
Interface, Stephen H. Goss, Department of Chemistry, Pennsylvania State
University
Surface Characterization Studies of Alumina-Supported Silver Catalysts used
for Ethylene Epoxidation, Dean Schoenfeld, University of Florida, Gainsville.
Quantitative 3-Dimensional Image Depth Profiling for Semiconductor Characterization,
Greg Gillen, NIST
Mechanisms of Silicon Ceside Ion Formation, Paul Oakey, Department of Chemistry,
Arizona State University
Secondary Ion Mass Spectrometry Characterization of Mg- and Si- Implanted
InP, Peter Chi, NIST
A Mechanistic View of Particle Ejection from keV Ion Bombarded Surfaces,
S.W. Rosencrance, Department of Chemistry, Pennsylvania State University
7:30 PM- CONFERENCE DINNER
May 9, 1995 SIMS WORKSHOP
8:30-10:10 AM INSTRUMENTAL USERS GROUPS
8:30- 8:50 Cameca IMS Service: Users Questions and Answers, Fabrice Le Duigou,
Cameca Instruments
8:50-9:10 Proper Use of the Dynamic Transfer System and Normal Incidence
Electron Gun, Michel Schuhmacher, Cameca Instruments
9:10-9:30 PHI SIMS Service: Users Questions and Answers , Larry Newman,
Physical Electronics
9:30- 9:50 Operational Characteristics and Maintenance of State-of-the-Art
Electron Multiplier Detectors Used in SIMS, John Gray, ETP Scientific, Auburn,
MA
9:50-10:10 Recent Advances in Turbomolecular Pump Design, Reese Puckett,
Balzers
10:10-10:30 Break
10:30-11:40 AM LISTSERVER/WWW/ASTM/INTERNATIONAL SIMS
SIMS Resources on the Internet
10:30-10:40 SIMS Listserver - An Electronic Conference for the SIMS Community,
Richard Lareau, ARL 10:40-10:50 Discussion of Proposed SIMS Workshop World
Wide Web (WWW) Page Greg Gillen, NIST and Richard Lareau, ARL
10:50-11:00 Peak Identification for Mass Spectrometry- Vers. 2.0, Richard
Lareau, ARL
ASTM E42.06
11:00-11:15 SIMS Subcommittee Meeting, Steve Hues, NRL
International SIMS Meeting (SIMS XI)
11:15-11:30 Preliminary Update on Site Selection for SIMS XI, SIMS User
Input
11:30 AM -12:30 PM NEW INSTRUMENTAL DEVELOPMENTS
11:30-12:00 New Developments in Imaging TOF-SIMS, Nick Winograd, Department
of Chemistry, Penn State University
12:00-12:30 Use of Resonance Ionization Microprobe Analysis in Material
Sciences, Heinrich F. Arlinghaus, Atom Sciences, Oak Ridge, TN
12:30-1:30 LUNCH
1:30- 5:30 PM FREE AFTERNOON
5:30 - 6:30 PM BEFORE DINNER MIXER 6:30- 7:30 PM VENDOR DINNER
7:30-10:30 PM VENDOR PRESENTATIONS
Cameca- New Developments in TOF SIMS Evans East Hessler Scientific (Ionoptika?).
PHI-Evans-
Tabletop displays (Cameca, Evans East, Hessler Sci, Evans-Phi, FEI, ETP,
Atom Sciences, Pulse Count Technologies)
May 10, 1995 SIMS WORKSHOP
8:30- 9:10 AM GENERAL SESSION
8:30- 8:50 AM Post Ionization of Sputtered Neutrals Using High- Intensity
Femtosecond Laser Pulses, K.F. Willey, Department of Chemistry, Pennsylvania
State University
8:50- 9:10 AM The Influence of Chemical Matrix Effects on Instrumental Mass
Bias During the Measurement of Oxygen Isotope Ratios in Insulators, Lee
R. Riciputi, Oak Ridge National Lab
9:10-12:30 AM DEPTH PROFILING/SEMICONDUCTOR CHARACTERIZATION
9:10-9:30 Profiling Shallow As Implants with Low Energy Cs on a Cameca 4F
and Report on the 3rd International Workshop on the Measurement and Characterization
of Ultra-Shallow Doping Profiles in Semiconductors, Joe Bennett, SEMATECH
9:30-9:50 Routine Low Energy Depth Profiling Using SIMS, Rolland Hill, Ionoptika
9:50-10:10 Backside SIMS Study of Non-Alloyed Ohmic Contacts on InP and
InGaAs, S. A. Schwarz, Department of Physics, Queens College, Flushing,
NY
10:10-10:40 Break
10:40 - 11:00 Surface Potential Sputter Profiling of Silicon Semiconductors,
Howard Smith, Digital Equipment Corp, Hudson, MA
11:00-11:20 Interfacial Oxide Measurements by Secondary Ion Mass Spectrometry
and Auger Electron Spectroscopy, Jim Christiansen, Motorola
11:20-11:50 Three inch wafer analysis in a Cameca 4F for optoelectronics
process development, Richard Streater, Bell Northern Research, Ottawa, Canada
11:50 -12:10 Characterization and Applications of a Focused Ion Beam (Ga+)
Quadrupole, Locke Christman, FEI , Hillsboro Oregon.
12:10-12:30 Development of a P in Si "Consensus Standard" Chuck
Hitzman, Charles Evans and Associates
12:30-1:30 PM LUNCH
1:30-3:30 PM TOF SIMS
1:30 - 1:50 SIMS Imaging of Paper Surface. Part 4. The Detection of Desizing
Agents on Hard to Size Paper Surfaces, Jerry Brinen, Cytec Industries, Stamford,
CT
1:50 - 2:10 Shallow Depth Profiles in Semiconductors with TOF SIMS, Franswa
Horreard, Cameca Instruments
2:10 - 2:30 Studies of Surface Charging in TOF-SIMS, X.Q. Guo, Oak Ridge
National Laboratory
2:30-2:50 Prospects for Biological Imaging, Christopher Brummel, Department
of Chemistry, Pennsylvania State University
2:50- 3:10 TOF SIMS Characterization of Binary Composition Monolayers of
Omega-Functionalized Alkanethiolates on Gold, Mark Wood, Department of Chemistry,
Pennsylvania State University.
3:10-3:30 Detection of Collectors on Mineral Grains by TOF-SIMS, Stephen
Chryssoulis, AMTEL, London, Ontario, Canada
3:30 Closing Remarks
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