9-EBSunset.jpg (143584 bytes)8TH ANNUAL WORKSHOP ON SECONDARY ION MASS SPECTROMETRY

The meeting was held at the Split Rock Resort and Conference Center, Lake Harmony, PA, May 7-10, 1995


May 8, 1995 SIMS WORKSHOP

8:30 AM - 5:30 PM TUTORIAL PRESENTATIONS

8:30-8:45 Opening Remarks/Welcome

8:45-9:30 The Relationship of SIMS to Billiards, Barbara J. Garrison, Department of Chemistry, Penn State University

9:30-10:15 A Brief Review of the Mechanisms for Secondary Atomic Ion Emission- Ming L. Yu, IBM , Yorktown Heights, NY 10:15-10:45 Break

10:45 -11:30 SIMS: Life, The Universe and Everything or How Secondary Ion Mass Spectrometry Can be Applied to a Wide Variety of Semiconductor Materials Problems", Charles W. Magee, Evans East, Plainsboro, New Jersey,

11:30 -12:15 How Quantitative is Dynamic SIMS Analysis of Semiconductors? Dave Simons, NIST

12:15 - 1:15 PM LUNCH

1:15 -2:00 Isotopic Ratio Measurements by SIMS, Larry Nittler, Department of Physics, Washington University, St. Louis, MO

2:00 -2:45 SIMS Imaging of Ionic and Molecular Transport at Subcellular Resolution, Subhash Chandra, Department of Chemistry, Cornell University

2:45 -3:15 Break

3:15 - 4:00 High Resolution Ion Microscopy, Jon Orloff, Department of Electrical Engineering, University of Maryland

4:00 -4:45 Analyzing the Kitchen Sink: A Review of Current Application Areas for TOF-SIMS and the Technology That Makes it Possible, Fraser Reich, PHI Evans

4:45- 5:30 Semiconductor Characterization Using Focused Ion Beams, Fred Stevie, AT&T
6:30-7:30 PM POSTER PRESENTATIONS/Happy Hour

The Depth Measurement of Craters Produced by Secondary Ion Mass Spectrometry-Results of a Stylus Profilometry Round-robin Study, Dave Simons, NIST

Detection of Sputtered Neutrals by Ultra-High Intensity Post Ionization, Michael L. Wise, AT&T Bell Labs, Murray Hill

Reaction Studies of Polycyclic Organic Matter on Silica Gel and Coal Flyash by TOF-SIMS, G.S. Strossman, Charles Evans and Associates

Kinetic Energy and Angular Distributions of Sputtered Molecules, Reema Chatterje, Department of Chemistry, Pennsylvania State University

Laser Ionization Studies of Sputtered Neutral Organic Molecules, Donald Riederer, Department of Chemistry, Pennsylvania State University

Angular Distribution of Ions from GaAs{100} c( 4x4) Reconstruction and GaA{100}/Al Interface, Stephen H. Goss, Department of Chemistry, Pennsylvania State University

Surface Characterization Studies of Alumina-Supported Silver Catalysts used for Ethylene Epoxidation, Dean Schoenfeld, University of Florida, Gainsville.

Quantitative 3-Dimensional Image Depth Profiling for Semiconductor Characterization, Greg Gillen, NIST

Mechanisms of Silicon Ceside Ion Formation, Paul Oakey, Department of Chemistry, Arizona State University

Secondary Ion Mass Spectrometry Characterization of Mg- and Si- Implanted InP, Peter Chi, NIST

A Mechanistic View of Particle Ejection from keV Ion Bombarded Surfaces, S.W. Rosencrance, Department of Chemistry, Pennsylvania State University

7:30 PM- CONFERENCE DINNER


May 9, 1995 SIMS WORKSHOP

8:30-10:10 AM INSTRUMENTAL USERS GROUPS

8:30- 8:50 Cameca IMS Service: Users Questions and Answers, Fabrice Le Duigou, Cameca Instruments

8:50-9:10 Proper Use of the Dynamic Transfer System and Normal Incidence Electron Gun, Michel Schuhmacher, Cameca Instruments

9:10-9:30 PHI SIMS Service: Users Questions and Answers , Larry Newman, Physical Electronics

9:30- 9:50 Operational Characteristics and Maintenance of State-of-the-Art Electron Multiplier Detectors Used in SIMS, John Gray, ETP Scientific, Auburn, MA

9:50-10:10 Recent Advances in Turbomolecular Pump Design, Reese Puckett, Balzers

10:10-10:30 Break

10:30-11:40 AM LISTSERVER/WWW/ASTM/INTERNATIONAL SIMS

SIMS Resources on the Internet

10:30-10:40 SIMS Listserver - An Electronic Conference for the SIMS Community, Richard Lareau, ARL 10:40-10:50 Discussion of Proposed SIMS Workshop World Wide Web (WWW) Page Greg Gillen, NIST and Richard Lareau, ARL

10:50-11:00 Peak Identification for Mass Spectrometry- Vers. 2.0, Richard Lareau, ARL

ASTM E42.06

11:00-11:15 SIMS Subcommittee Meeting, Steve Hues, NRL

International SIMS Meeting (SIMS XI)

11:15-11:30 Preliminary Update on Site Selection for SIMS XI, SIMS User Input

11:30 AM -12:30 PM NEW INSTRUMENTAL DEVELOPMENTS

11:30-12:00 New Developments in Imaging TOF-SIMS, Nick Winograd, Department of Chemistry, Penn State University

12:00-12:30 Use of Resonance Ionization Microprobe Analysis in Material Sciences, Heinrich F. Arlinghaus, Atom Sciences, Oak Ridge, TN

12:30-1:30 LUNCH

1:30- 5:30 PM FREE AFTERNOON

5:30 - 6:30 PM BEFORE DINNER MIXER 6:30- 7:30 PM VENDOR DINNER

7:30-10:30 PM VENDOR PRESENTATIONS

Cameca- New Developments in TOF SIMS Evans East Hessler Scientific (Ionoptika?). PHI-Evans-

Tabletop displays (Cameca, Evans East, Hessler Sci, Evans-Phi, FEI, ETP, Atom Sciences, Pulse Count Technologies)


May 10, 1995 SIMS WORKSHOP

8:30- 9:10 AM GENERAL SESSION

8:30- 8:50 AM Post Ionization of Sputtered Neutrals Using High- Intensity Femtosecond Laser Pulses, K.F. Willey, Department of Chemistry, Pennsylvania State University

8:50- 9:10 AM The Influence of Chemical Matrix Effects on Instrumental Mass Bias During the Measurement of Oxygen Isotope Ratios in Insulators, Lee R. Riciputi, Oak Ridge National Lab

9:10-12:30 AM DEPTH PROFILING/SEMICONDUCTOR CHARACTERIZATION

9:10-9:30 Profiling Shallow As Implants with Low Energy Cs on a Cameca 4F and Report on the 3rd International Workshop on the Measurement and Characterization of Ultra-Shallow Doping Profiles in Semiconductors, Joe Bennett, SEMATECH

9:30-9:50 Routine Low Energy Depth Profiling Using SIMS, Rolland Hill, Ionoptika

9:50-10:10 Backside SIMS Study of Non-Alloyed Ohmic Contacts on InP and InGaAs, S. A. Schwarz, Department of Physics, Queens College, Flushing, NY

10:10-10:40 Break

10:40 - 11:00 Surface Potential Sputter Profiling of Silicon Semiconductors, Howard Smith, Digital Equipment Corp, Hudson, MA

11:00-11:20 Interfacial Oxide Measurements by Secondary Ion Mass Spectrometry and Auger Electron Spectroscopy, Jim Christiansen, Motorola

11:20-11:50 Three inch wafer analysis in a Cameca 4F for optoelectronics process development, Richard Streater, Bell Northern Research, Ottawa, Canada

11:50 -12:10 Characterization and Applications of a Focused Ion Beam (Ga+) Quadrupole, Locke Christman, FEI , Hillsboro Oregon.

12:10-12:30 Development of a P in Si "Consensus Standard" Chuck Hitzman, Charles Evans and Associates

12:30-1:30 PM LUNCH

1:30-3:30 PM TOF SIMS

1:30 - 1:50 SIMS Imaging of Paper Surface. Part 4. The Detection of Desizing Agents on Hard to Size Paper Surfaces, Jerry Brinen, Cytec Industries, Stamford, CT

1:50 - 2:10 Shallow Depth Profiles in Semiconductors with TOF SIMS, Franswa Horreard, Cameca Instruments

2:10 - 2:30 Studies of Surface Charging in TOF-SIMS, X.Q. Guo, Oak Ridge National Laboratory

2:30-2:50 Prospects for Biological Imaging, Christopher Brummel, Department of Chemistry, Pennsylvania State University

2:50- 3:10 TOF SIMS Characterization of Binary Composition Monolayers of Omega-Functionalized Alkanethiolates on Gold, Mark Wood, Department of Chemistry, Pennsylvania State University.

3:10-3:30 Detection of Collectors on Mineral Grains by TOF-SIMS, Stephen Chryssoulis, AMTEL, London, Ontario, Canada

3:30 Closing Remarks


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